Development of a pattering process for flexible TFT Displays based on Inkjet and imprint technology

At TNO, Patterning for Flexible Systems

Internship description:

Holst Centre is an independent open-innovation R&D center that develops generic technologies for Wireless Autonomous Sensor Technologies and for Flexible Electronics. A key feature of Holst Centre is its partnership model with industry and academia around shared roadmaps and programs. It is this kind of cross-fertilization that enables Holst Centre to tune its scientific strategy to industrial needs.

Located on High Tech Campus Eindhoven (Netherlands), Holst Centre benefits from, and contributes to, the state-of-the-art on-site facilities (> 6000m² of clean rooms). Holst Centre has over 170 research staff from about 25 nationalities and a commitment from more than 30 industrial partners.

As an intern student you will be a team member of the “Patterning for flexible substrate” group, where you will be involved in a recently launch project where the aim is to develop patterning solutions and process for the next generation of Thin Film Transistors, using state of the art technology such as nano imprint lithography, inkjet printing and mask based lithography. The aim of the project is to create flexible TFT backplane for dynamic displays.

Profile:
We are looking for a master student who desires to accomplish at least a six month internship within our research center. The master topic should fit within the themes micro/nano engineering and material science. We are looking for an innovative, dynamic and English proficient candidate.

For all inquiries, please contact:

For more information please contact Sami Sabik (sami.sabik@tno.nl) or Merijn Wijnen (merijn.wijnen@tno.nl)

Application form